Deep Uv Beam Splitter

The uv beamsplitters are designed for a 45 degree angle of incidence and are available in 50 50 and 30 70 reflectance transmittance ratios in 250 450 nm spectral range.

Deep uv beam splitter.

Each individual splitted beam inherits the basic properties of input beam such as polarization phase and size. Thorlabs 50 50 uv fused silica broadband beamsplitters which are available in ø1 2 ø1 25 mm x 36 mm and ø2 versions have a beamsplitter coating for the 250 450 nm range deposited on the front surface that has been optimized for a 45 angle of incidence. Edmund optics anti reflection coatings are designed for the ultraviolet uv visible of infrared ir. A dielectric coating provides long term stability.

Our quality range is coated on n bk7 or equivalent substrates our standard range is coated on white float glass and our economy range is coated on a soda lime float glass substrate. Techspec uv plate beamsplitters offer optimum performance in the 250 450nm spectral range and feature low absorption and negligible ghost reflections. Polarizing beamsplitters often used in photonics instrumentation split light by polarization state. Fan outs are multi level doe components designed and fabricated with the aim of splitting an input beam into n x m beams with adjustable separation between them.

Aside from our economy range all our plate beamsplitter are coated. Non polarizing beamsplitters ideal for laser beam manipulation split light by overall intensity. We recently modified the shrs by replacing the cube beam splitter bs with a custom plate beam splitter with higher light transmission an optimized. Spectrometer shrs for deep ultraviolet uv raman measurements and showed its ability to measure uv light sensitive compounds using a large laser spot size.

The choice of the beamsplitting ratios allows the scientist to use this beamsplitter in multiple applications that may require an even split or a 30 70 split. Plate beamsplitters have the splitter coating on one surface of a suitable window material. The precision fused silica substrate has been designed to minimize the additional optical path length a beamsplitter adds to an imaging or photonic system.